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CVD System with Solid Precursor Unit
Overview： A solid-precursor introduction unit was added at the upper stream of our standard CVD system [MPCVD series]. Sublimed vapors of metallic compounds or oxides can be introduced in to CVD reaction zone for reaction and film deposition.
Characteristic：
- Solid precursors can be heated with its individual heater.
- The flow rate of the carrier gas into the solid precursor chamber can be controlled separately.
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