Laser-Assisted CVD Chamber for Film Deposition

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Laser-Assisted CVD Chamber for Film Deposition

Overview:    A vacuum chamber with a special window for transmission of UV laser beam was fabricated for the use of laser-assist CVD. NH3 and C2H3 gas flow meters were quipped, allowing us to deposit nitrogen-carbon compound, which will show photocatalytic effect.
Characteristic:    
  • 3-line mass-flow controllers and substrate-heating unit were equipped.
  • Corrosive-resistant rotary pump was equipped.