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Nanoflex 400
PVD-PECVD hybrid system
Nanoflex 400 is a compact system designed for both decorative and technical applications.
Nanoflex 400 belongs to the flexible machine series, optmised for the production of small and medium-sized objects.
High flexibility is one of the most important features. In fact, different PVD and PECVD technologies can be installed: for example Cathodic Arc, Magnetron Sputtering (in different configurations, Balanced, Unbalanced, DMS, HiPiMS) and Plasma Beam Source.
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System features
- Decorative and technical coatings
- Customised solutions
- Top loading
- Process optimisation
- Good process repeatability
- Simple maintenance
- Extremely compact
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Characteristics
Useful volume ᴓ 850mmx400m
Internal chamber dimensions 1030x650mm
Made entirely of stainless steel
Max. temp.: 550° C
Removable turntable
Industry 4.0 software
Technologies
Dry pumps
Turbomolecular pumps
Sources
Cathodic Arc LDE
Cathodic Arc RCAE
Magnetron Sputtering
Dual Magnetron Sputtering
HiPIMS
Plasma Beam Source
Other on request
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Control
PLC and industrial computer with diagnostic features
Gas mass flow meters
Safety system
Numerous safety interlocks to protect operators and the system.
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