RF Plasma-Assisted CVD System

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MPCVD-Plasma                                                                            onization of gas or precursor by plasma

Outline:     

  •  Thermal CVD system equipped with a RF-coil at the upper stream, which leads to effective ionization of input gases or precursors, and assists effective                   CVD reactions.
  •  We will fabricate the system with customized specifications to meet to your purposes. Please contact us for your detail requests.