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The COPRA RF-ICP Plasma Beam Source
The COPRA RF-ICP Plasma Beam Technology based on its inductively coupled 13,56 MHz excitation. Scalable from R&D to more or less any kind of industrial production scale the COPRA´s unrivaled characteristics allows one to work with constant basic plasma parameters. This means that your process result is not negatively affected by scaling in this and speed as long as the right power level is adjusted. The COPRA RF-ICP sources are working gas independent, reliable and maintenance poor. This makes them perfectly suited to full-fill your process and application needs. The Standard COPRA delivers a high ion current (ICD) at constantly low ion energies (IE) which can be easily controlled and adjusted if needed. The always integrated RF-Matching-Network as well as the possibility of customization and freedom of scalability completes our portfolio.
COPRA Built In Plasma Sources (IS-Series)
The COPRA Built In Plasma Sources (IS-Series) have been developed for the precision optical coating segment. The Special design allows you to place the source fully in the vacuum chamber and enables low energy Ion assisted deposition (IBAD) by using one source for calotte-/dome sizes of up to 2.2 meter. These E-Gun/E-Beam assisting source types can run with pure gases and drive down significantly your maintenance costs. The IS-Series are hybrid PVD/PECVD capable. This means you can run the PVD Assist and the PECVD with the same source as f.e. DLC coatings for Optics.
The COPRA Built In Plasma Sources (IS-Series) are suitable for…
Ion Beam Assisted Deposition (IBAD)
Plasma treatment like Surface Activation & Cleaning
Plasma Enhanced Chemical Vapor Deposition in thermal and e-beam evaporator (PECVD)
Plasma Etching (chem./soft/fast)
Built In Plasma Beam Sources