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MPS-200-RIE — Reactive Ion Etcher
Best built R&D or low volume production tool available
Si, SiO2, SiNx, Metals, TiW, GaAs, resist, ILD and polyimide, micromachining (MEMS), photonics, HTSC's, and for failure analysis
Accepts any size substrate from 1" to 12" wafers, flat panels, or custom packages
Easy to use and simple to service
Safe, rugged design means high reliability with remarkable uptime
Simple 5 piece chamber construction is versatile and easy to upgrade
Multi-use process kit with virtually no process memory effect
Advanced Reactor technologies, such as RIE, RIE/PE, and ICP are available as standard modules.
Product Summary
The classic, high performance, value priced, RIE plasma tool used throughout the world for over ten years - and still going strong!
This system is your best bet when you have a variety of demanding applications.
The MPS-RIE is great for day-to-day use at the push of a button.
MPS-RIE Features
- Modular Design for Ease of Maintenance
- Single or Dual Chamber
- Batch or Single Substrate
- Small Foot Print
- Stainless Steel or Aluminum Process Chambers
- Cost Effective Process Solution
- Automatic Process Controller using Windows®
- MPS-XX0-RIE available in 50-150, 200, & 300 mm versions
- Manual load or a variety of vacuum load locks are available.
- The MPS series is also available as an OEM module to integrate to existing system platforms
