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E-Electron Beam Evaporation System can come in a compact vertical dual chamber configuration consisting of the 16” cube main chamber where platen is located and a secondary chamber for housing the e-beam source. This configuration can be provided with a gate valve between the two chambers to be used as a load lock to keep the e-beam source and the evaporation pockets in vacuum while substrate is loaded and unloaded from the main chamber. On other applications where automatic loading and unloading of wafer is needed, a third load lock chamber is attached to the left face of the cube. In this case, the main chamber can be kept at low 10-7 Torr range at all times, and wafer loading to start of the evaporation can be less than few minutes
